F2 Laser Resist with Fluorinated Polymers
Fluorinated organic compounds are applied as F2 laser resists due to their high transparency at 157nm. The relationship between numbers/positions of fluorine atoms in a repeating unit of the fluorinated polymers and their physical/chemical properties (solubility parameter and hydrophilicity) for F2...
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Veröffentlicht in: | Journal of Photopolymer Science and Technology 2002, Vol.15(4), pp.689-692 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | Fluorinated organic compounds are applied as F2 laser resists due to their high transparency at 157nm. The relationship between numbers/positions of fluorine atoms in a repeating unit of the fluorinated polymers and their physical/chemical properties (solubility parameter and hydrophilicity) for F2 laser resist is discussed. Fluorine at suitable position improves hydrophilicity without lowering the solubility parameter. We propose a novel polymer suitable for F2 excimer laser resists consisting of the polymer with fluorine atoms connecting to proper positions. |
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ISSN: | 0914-9244 1349-6336 |
DOI: | 10.2494/photopolymer.15.689 |