F2 Laser Resist with Fluorinated Polymers

Fluorinated organic compounds are applied as F2 laser resists due to their high transparency at 157nm. The relationship between numbers/positions of fluorine atoms in a repeating unit of the fluorinated polymers and their physical/chemical properties (solubility parameter and hydrophilicity) for F2...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2002, Vol.15(4), pp.689-692
Hauptverfasser: Naito, Takuya, Saito, Satoshi, Shida, Naomi, Ushirogouchi, Tohru
Format: Artikel
Sprache:eng
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Zusammenfassung:Fluorinated organic compounds are applied as F2 laser resists due to their high transparency at 157nm. The relationship between numbers/positions of fluorine atoms in a repeating unit of the fluorinated polymers and their physical/chemical properties (solubility parameter and hydrophilicity) for F2 laser resist is discussed. Fluorine at suitable position improves hydrophilicity without lowering the solubility parameter. We propose a novel polymer suitable for F2 excimer laser resists consisting of the polymer with fluorine atoms connecting to proper positions.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.15.689