Newly developed acrylic copolymers for ArF photoresist
We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA i...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2002, Vol.15(4), pp.535-540 |
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| container_issue | 4 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Kamon, Yoshihiro Momose, Hikaru Kuwano, Hideaki Fujiwara, Tadayuki Fujimoto, Masaharu |
| description | We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts. |
| doi_str_mv | 10.2494/photopolymer.15.535 |
| format | Article |
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The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.15.535</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>acrylic copolymer ; ArF photoresist ; DMMB ; etching durability ; hydrophilic part ; OTDMA ; solubility</subject><ispartof>Journal of Photopolymer Science and Technology, 2002, Vol.15(4), pp.535-540</ispartof><rights>The Technical Association of Photopolymers, Japan</rights><rights>Copyright Japan Science and Technology Agency 2002</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c537t-5ea949ed853e9e9be5e5c1c063513e20a6ad56bc08511ca94ff601a3f20b287d3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Kamon, Yoshihiro</creatorcontrib><creatorcontrib>Momose, Hikaru</creatorcontrib><creatorcontrib>Kuwano, Hideaki</creatorcontrib><creatorcontrib>Fujiwara, Tadayuki</creatorcontrib><creatorcontrib>Fujimoto, Masaharu</creatorcontrib><title>Newly developed acrylic copolymers for ArF photoresist</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.</description><subject>acrylic copolymer</subject><subject>ArF photoresist</subject><subject>DMMB</subject><subject>etching durability</subject><subject>hydrophilic part</subject><subject>OTDMA</subject><subject>solubility</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNpVkMFOwzAQRC0EEqXwBVwicU7xxl43PlYVBaQKLnC2XGdDU6V1sFNQ_p6UQAWX3ct7M9Iwdg18kkktb5u1b33j625LYQI4QYEnbARC6lQJoU7ZiGuQqc6kPGcXMW44FwJRj5h6os-6Swr6oNo3VCTWha6uXOJ-82JS-pDMwiL5bgkUq9hesrPS1pGufv6YvS7uXuYP6fL5_nE-W6YOxbRNkayWmoocBWnSK0JCB44rgSAo41bZAtXK8RwBXM-WpeJgRZnxVZZPCzFmN0NuE_z7nmJrNn4fdn2lASmlyqRS0FNioFzwMQYqTROqrQ2dAW4OA5m_AxlA0w_UW8vB2sTWvtHRsaGtXE3_HNB5fvDkcHr9iLm1DYZ24gsEw3kq</recordid><startdate>20020101</startdate><enddate>20020101</enddate><creator>Kamon, Yoshihiro</creator><creator>Momose, Hikaru</creator><creator>Kuwano, Hideaki</creator><creator>Fujiwara, Tadayuki</creator><creator>Fujimoto, Masaharu</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20020101</creationdate><title>Newly developed acrylic copolymers for ArF photoresist</title><author>Kamon, Yoshihiro ; Momose, Hikaru ; Kuwano, Hideaki ; Fujiwara, Tadayuki ; Fujimoto, Masaharu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c537t-5ea949ed853e9e9be5e5c1c063513e20a6ad56bc08511ca94ff601a3f20b287d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>acrylic copolymer</topic><topic>ArF photoresist</topic><topic>DMMB</topic><topic>etching durability</topic><topic>hydrophilic part</topic><topic>OTDMA</topic><topic>solubility</topic><toplevel>online_resources</toplevel><creatorcontrib>Kamon, Yoshihiro</creatorcontrib><creatorcontrib>Momose, Hikaru</creatorcontrib><creatorcontrib>Kuwano, Hideaki</creatorcontrib><creatorcontrib>Fujiwara, Tadayuki</creatorcontrib><creatorcontrib>Fujimoto, Masaharu</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kamon, Yoshihiro</au><au>Momose, Hikaru</au><au>Kuwano, Hideaki</au><au>Fujiwara, Tadayuki</au><au>Fujimoto, Masaharu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Newly developed acrylic copolymers for ArF photoresist</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2002-01-01</date><risdate>2002</risdate><volume>15</volume><issue>4</issue><spage>535</spage><epage>540</epage><pages>535-540</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. 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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | acrylic copolymer ArF photoresist DMMB etching durability hydrophilic part OTDMA solubility |
| title | Newly developed acrylic copolymers for ArF photoresist |
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