Newly developed acrylic copolymers for ArF photoresist

Newly developed acrylic copolymers for ArF photoresist

We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA i...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2002, Vol.15(4), pp.535-540
Hauptverfasser: Kamon, Yoshihiro, Momose, Hikaru, Kuwano, Hideaki, Fujiwara, Tadayuki, Fujimoto, Masaharu
Format: Artikel
Sprache:eng
Schlagworte:
acrylic copolymer
ArF photoresist
DMMB
etching durability
hydrophilic part
OTDMA
solubility
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Zusammenfassung:We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9-methacryloyloxy-4-oxatricyclo[5.2.1.02, 6]decan-3-one (OTDMA) and γ, γ-dimethyl-α-methylene-γ-butyrolactone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.15.535