Photosensitive Titania Polymers

A metal containing negative working photoresist is derived from crosslinkable organotitanium polymer which upon exposure to an oxygen plasma or baking in air, is converted to titanium dioxide (titania) or to a mixed, titanium-organic containing metal oxide. The metal oxide formed in situ imparts etch resistance, depending on the post applied bake process, to a bilayer lithographic process. The composition may also be directly deposited and patterned into permanent metal oxide device feature by a photolithographic process, or can be applied as dielectric bottom antireflective coating.