Sensitized Transparent Photobase Additive For 193nm Lithography

This paper reports on the use of trimethyl sulfonium hydroxide as a base additive for 193nm applications, which is found to stabilize the latent image as well as act as a photodecomposable base. Delay time stability (exposure to post-exposure bake) of formulations consisting of trimethylsulfonium hy...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of Photopolymer Science and Technology 2000, Vol.13(4), pp.617-624
Hauptverfasser:	Padmanaban, Munirathna, Bae, Jun-Born, Cook, Michelle, Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R, Byers, Jeffrey D.
Format:	Artikel
Sprache:	eng
Schlagworte:	193nm resists methyl-adammantyl-methacrylate trimethyl sulfonium hydroxide
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!