Characterization of Water-Soluble Acrylic Resist Using a Novel Photoinitiator

This paper describes a novel water-soluble radical photoinitiator, sodium 4-[2-(4- morpholino)benzoyl-2-dimethylamino]butylbenzenesulfonate (MBS) and an "environmentally friendly" photopolymerization resist system using MBS. MBS has been synthesized by sulfonation of 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)- butanone-1 (BDMB), which promises great utility in organic solvent systems. MBS shows sufficient solubility in water and has high photosensitivity comparable to that of BDMB. Water-soluble photoresists composed of base polymers, a trifunctional epoxy acrylate monomer DA-314 and MBS have also evaluated. The resist using polyvinylpyrrolidone (PVP) has shown high sensitivity (0.23mJ/cm2).