Contrast Boosted Resist Using Base-Labile Compound for Electron Beam Lithography

Contrast Boosted Resist Using Base-Labile Compound for Electron Beam Lithography

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Veröffentlicht in:Journal of Photopolymer Science and Technology 1997, Vol.10(3), pp.377-378
Hauptverfasser: Uchino, Shou-ichi, Migitaka, Sonoko, Yamamoto, Jiro, Murai, Fumio, Kojima, Kyoko, Tanaka, Toshihiko
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Sprache:eng
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contrast boosted resist
electron beam
novolak
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container_title Journal of Photopolymer Science and Technology
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creator Uchino, Shou-ichi
Migitaka, Sonoko
Yamamoto, Jiro
Murai, Fumio
Kojima, Kyoko
Tanaka, Toshihiko
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doi_str_mv 10.2494/photopolymer.10.377
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source J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry
subjects contrast boosted resist
electron beam
novolak
title Contrast Boosted Resist Using Base-Labile Compound for Electron Beam Lithography
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