NOVEL ArF EXCIMER LASER RESISTS BASED ON MENTHYL METHACRYLATE TERPOLYMER

NOVEL ArF EXCIMER LASER RESISTS BASED ON MENTHYL METHACRYLATE TERPOLYMER

Recent advances in the single-layer resist for forming finer patterns have led us to a search for new resist materials for the ArF excimer laser. We describe a novel, environmentally friendly, single-layer resist based on a menthyl methacrylate terpolymer which has good dry etch resistance and high...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 1996, Vol.9(3), pp.457-464
Hauptverfasser: SHIDA, Naomi, USHIROGOUCHI, Tohru, ASAKAWA, Kohji, NAKASE, Makoto
Format: Artikel
Sprache:eng
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Zusammenfassung:Recent advances in the single-layer resist for forming finer patterns have led us to a search for new resist materials for the ArF excimer laser. We describe a novel, environmentally friendly, single-layer resist based on a menthyl methacrylate terpolymer which has good dry etch resistance and high transparency in the wavelength region of ArF emission.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.9.457