DEVELOPMENT OF POSITIVE ELECTRON-BEAM CHEMICAL AMPLIFICATION RESISTS USING TETRAHYDROPYRANYL-PROTECTED POLYVINYLPHENOL

Chemical amplification positive resists using tetrahydropyranyl-protected polyvinylphenol (THP-M) were investigated for electron-beam lithography. To enhance the resist performance, we used a new novolak resin and trimethylsulfonium triflate (MES) as an acid generator. The novolak resin has a large...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 1995, Vol.8(1), pp.21-28
Hauptverfasser:	Katoh, Kohji, Hashimoto, Michiaki, Sakamizu, Toshio, Shiraishi, Hiroshi, Ueno, Takumi
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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