Synthesis, Structure and Photosensitivity of Isoprene-Resorcin Resin

The synthesis of isoprene-resorcin resin is described in details. Effects of solvent, catalyst, reaction temperature and molar ratio of the reactants on the reaction are discussed. Structure analysis for the products shows that when the molar ratio of resorcin to isoprene is 1:1, the most probable product is -R-IP-R-IP- type polymer. When azides or polyhalides as crosslinking agent were added into the mixture consisted of a resin with low softening point and a special novolak with relatively high softening point, a new type of photoresist was prepared. Its minimum quantity of exposure energy required is 10mJ/cm2, and the resolution is about 2μm. It can be developed by dilute alkai solution. The photocured film has excellent resistance to acids.