III-V nanowire photovoltaics: Review of design for high efficiency

This article reviews recent developments in nanowire‐based photovoltaics (PV) with an emphasis on III–V semiconductors including growth mechanisms, device fabrication and performance results. We first review the available nanowire growth methods followed by control of nanowire growth direction and c...

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Veröffentlicht in:Physica status solidi. PSS-RRL. Rapid research letters 2013-10, Vol.7 (10), p.815-830
Hauptverfasser: LaPierre, R. R., Chia, A. C. E., Gibson, S. J., Haapamaki, C. M., Boulanger, J., Yee, R., Kuyanov, P., Zhang, J., Tajik, N., Jewell, N., Rahman, K. M. A.
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Sprache:eng
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Zusammenfassung:This article reviews recent developments in nanowire‐based photovoltaics (PV) with an emphasis on III–V semiconductors including growth mechanisms, device fabrication and performance results. We first review the available nanowire growth methods followed by control of nanowire growth direction and crystal structure. Important device issues are reviewed, including optical absorption, carrier collection, strain accommodation, design for high efficiency, tunnel junctions, Ohmic contact formation, passivation and doping. Performance data of III–V nanowire cells and the primary challenges in nanowire PV are summarized. Many of the issues discussed here are also applicable to other nanowire devices such as photodetectors. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) Part of Focus Issue on “Semiconductor Nanowires” (Eds.: Chennupati Jagadish, Lutz Geelhaar, Silvija Gradecak) To overcome the limitations of current III–V multi‐junction solar photovoltaic (PV) cells, III–V nanowire‐based PV is being aggressively pursued by numerous groups. This article provides a comprehensive review of nanowire‐based PV covering all aspects of design for high power conversion efficiency including nanowire growth methods, growth direction, crystal structure, optical absorption, carrier collection, strain accommodation, tunnel junctions, Ohmic contact formation, passivation and doping.
ISSN:1862-6254
1862-6270
DOI:10.1002/pssr.201307109