Grain Growth of [beta]-Silicon Nitride in RE(RE=Y, Gd, Nd and La)-Mg-Si-O-N Melts

Isothermal growth of β-Si3N4 crystals dispersed in rare-earth (RE=Y, Gd, Nd and La) oxynitride melts (RE-Mg-Si-O-N) was studied during heat treatment at 1773 K under 0.9 MPa of nitrogen pressure for 64 to 512 min. The microstructure of β-Si3N4 crystals was characterized by electron microscopy. It is...

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Veröffentlicht in:Nihon Kinzoku Gakkai shi (1952) 2005-08, Vol.69 (8), p.719
Hauptverfasser: Nakata, Daiji, Saito, Noritaka, Umemoto, Ayumu, Nakashima, Kunihiko
Format: Artikel
Sprache:eng
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Zusammenfassung:Isothermal growth of β-Si3N4 crystals dispersed in rare-earth (RE=Y, Gd, Nd and La) oxynitride melts (RE-Mg-Si-O-N) was studied during heat treatment at 1773 K under 0.9 MPa of nitrogen pressure for 64 to 512 min. The microstructure of β-Si3N4 crystals was characterized by electron microscopy. It is found that the rate of α-β transformation increases with decreasing ionic radius of the rare-earth element. Likewise, the radii of rare-earth elements make significant differences in the morphology and mean aspect ratio of β-Si3N4. Especially, the aspect ratio of β-Si3N4 crystals with the additive of La2O3 was found to be much larger than that in oxynitride melts with additives of others.
ISSN:0021-4876
1880-6880