Atomic Layer Deposition Al2O3 Films for Permanent Magnet Isolation in TMR Read Heads

TEMs of sub-100 nm TMR readers fabricated using these processes show [greater-than] 95% conformality on junction sidewalls, indicating nonselective growth of ALD Al2O3 on the various stack and bottom shield surfaces.

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Bibliographische Detailangaben
Veröffentlicht in:	IEEE transactions on magnetics 2008-11, Vol.44 (11), p.3576-3579
Hauptverfasser:	KAUTZKY, Michael C, DEMTCHOUK, Alexandre V, YONGHUA CHEN, BROWN, Kelly M, MCKINLAY, Shaun E, JIANHUA XUE
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology Magnetism Materials science Other topics in materials science Physics
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	TEMs of sub-100 nm TMR readers fabricated using these processes show [greater-than] 95% conformality on junction sidewalls, indicating nonselective growth of ALD Al2O3 on the various stack and bottom shield surfaces.
ISSN:	0018-9464 1941-0069
DOI:	10.1109/TMAG.2008.2001795