Control of the properties of thin-film systems with the use of pulsed photon treatment

We have developed a radically new technological process of making very large-scale integrated circuits, which has no analogs and is based on the use of fast heat treatments for forming gettering layers, silicon oxidation, annealing of ion-doped layers, fusion of phosphoro- and borophosphorosilicate glasses, forming silicides, and increasing the thermostability of aluminum metallization.[PUBLICATION ABSTRACT]