Preparation of N-doped TiO2 photocatalyst by atmospheric pressure plasma process for VOCs decomposition under UV and visible light sources

The nitrogen doped (N-doped) titanium dioxide (TiO2) photocatalyst was prepared by the atmospheric-pressure plasma-enhanced nanoparticles synthesis (APPENS) process operated under normal temperature, i.e. the dielectric barrier discharge plasma process. The N2 carrier gas is dissociated in the AC powered nonthermal plasma environment and subsequently doped into the TiO2 photocatalyst that was capable of being induced by visible light sources. The APPENS process for producing N-doped TiO2 showed a higher film deposition rate in the range of 60–94 nm/min while consuming less power (