High-Performance Zn-Diffusion 850-nm Vertical-Cavity Surface-Emitting Lasers With Strained InAlGaAs Multiple Quantum Wells
We demonstrate a high-performance Zn-diffusion 850-nm vertical-cavity surface-emitting laser (VCSEL). By the use of strained InAlGaAs/AlGaAs multiple quantum wells for the active region, our structure can have a much higher maximum output power, higher differential quantum efficiency (DQE), and larg...
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Veröffentlicht in: | IEEE photonics journal 2010-12, Vol.2 (6), p.960-966 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We demonstrate a high-performance Zn-diffusion 850-nm vertical-cavity surface-emitting laser (VCSEL). By the use of strained InAlGaAs/AlGaAs multiple quantum wells for the active region, our structure can have a much higher maximum output power, higher differential quantum efficiency (DQE), and larger modulation current efficiency (D-factor) than those of non-strained control GaAs/AlGaAs VCSELs. Two different Zn-diffusion depths were adopted in our devices with the same single-oxide current-confined aperture (~6 μm) to further optimize the static and dynamic performance, respectively. The device with a deep Zn-diffusion depth (~1.2 μm) shows an optimized static performance, which includes a low threshold current (0.8 mA), high DQE (90% at ~1.2 mA), and a maximum output power as high as 9.7 mW. On the other hand, the device with a shallow Zn-diffusion depth ( |
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ISSN: | 1943-0655 1943-0647 |
DOI: | 10.1109/JPHOT.2010.2089441 |