A 4 Mb LV MOS-Selected Embedded Phase Change Memory in 90 nm Standard CMOS Technology

A 4 Mb embedded phase change memory macro has been developed in a 90 nm 6-ML CMOS technology. The storage element has been integrated using 3 additional masks with respect to process baseline. The cell selector is implemented by a standard LV nMOS device, achieving a cell size of 0.29 μm 2 . A dual-...

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Veröffentlicht in:IEEE journal of solid-state circuits 2011-01, Vol.46 (1), p.52-63
Hauptverfasser: De Sandre, G, Bettini, L, Pirola, A, Marmonier, L, Pasotti, M, Borghi, M, Mattavelli, P, Zuliani, P, Scotti, L, Mastracchio, G, Bedeschi, F, Gastaldi, R, Bez, R
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Sprache:eng
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Zusammenfassung:A 4 Mb embedded phase change memory macro has been developed in a 90 nm 6-ML CMOS technology. The storage element has been integrated using 3 additional masks with respect to process baseline. The cell selector is implemented by a standard LV nMOS device, achieving a cell size of 0.29 μm 2 . A dual-voltage row decoder and a double-path column decoder are introduced, enabling a completely low voltage read operation. A 20b-parallelism write scheme is embedded in the digital controller in order to maximize throughput. In alternative, a power-saving low-parallelism write algorithm can be employed. The macro features a 1.2 V 12 ns read access time and a write throughput of 1 MB/s. Set and reset current distributions showing a good read window are presented and robust reliability results are demonstrated.
ISSN:0018-9200
1558-173X
DOI:10.1109/JSSC.2010.2084491