Low-frequency pseudogeneration-Recombination noise of MOSFET's stressed by channel hot electrons in weak inversion
Up to now, the effect of trap distribution over distance in the oxide on low-frequency noise has not been verified experimentally. In this paper, a new method to detect the pseudo-g-r noise, caused by a nonuniform trap distribution, is proposed using MOSFET's stressed by channel hot electrons....
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Veröffentlicht in: | IEEE transactions on electron devices 1986-04, Vol.33 (4), p.516-519 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Up to now, the effect of trap distribution over distance in the oxide on low-frequency noise has not been verified experimentally. In this paper, a new method to detect the pseudo-g-r noise, caused by a nonuniform trap distribution, is proposed using MOSFET's stressed by channel hot electrons. The experimental results are interpreted well by the early given theories and show that the pseudo-g-r noise can be obtained provided that the MOSFET's are aged sufficiently by electrical stress and operate in weak inversion. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/T-ED.1986.22521 |