Transport phenomena in amorphous silicon doped by ion implanted of 3d metals

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Veröffentlicht in:Physica status solidi. A, Applied research Applied research, 1986, Vol.95 (2), p.635-640
Hauptverfasser: DVURECHENSKII, A. V, DRAVIN, V. A, RYAZANTSEV, I. A, ANTONENKO, A. K, LANDOCHKIN, I. G
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container_title Physica status solidi. A, Applied research
container_volume 95
creator DVURECHENSKII, A. V
DRAVIN, V. A
RYAZANTSEV, I. A
ANTONENKO, A. K
LANDOCHKIN, I. G
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ispartof Physica status solidi. A, Applied research, 1986, Vol.95 (2), p.635-640
issn 0031-8965
1521-396X
language eng
recordid cdi_pascalfrancis_primary_8115640
source Access via Wiley Online Library
subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Conductivity phenomena in semiconductors and insulators
Electronic transport in condensed matter
Exact sciences and technology
Physics
Thermoelectric and thermomagnetic effects
title Transport phenomena in amorphous silicon doped by ion implanted of 3d metals
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