Effect of substrate and deposition rate on DC magnetron sputtered Co-Cr thin films

Effect of substrate and deposition rate on DC magnetron sputtered Co-Cr thin films

Effects of substrate and deposition rate were studied for DC magnetron sputtered CoCr thin films. The coercivity of the deposited CoCr thin films were nearly independent of the deposition rate over the range from 11Å/sec to 55Å/sec. The surface micrographs of the films reveal that the thermal conduc...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on magnetics 1986-09, Vol.22 (5), p.1152-1154
Hauptverfasser: Ravipati, D., Sivertsen, J., Judy, J.
Format: Artikel
Sprache:eng
Schlagworte:
Analysing. Testing. Standards
Applied sciences
Coercive force
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Conductive films
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Glass
Magnetic films
Magnetic properties
Magnetic properties and materials
Magnetic properties of surface, thin films and multilayers
Materials science
Measurement of properties and materials state
Metals, semimetals and alloys
Metals. Metallurgy
Microstructure
Nondestructive testing
Perpendicular magnetic recording
Physics
Semiconductor films
Specific materials
Sputtering
Substrates
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Effects of substrate and deposition rate were studied for DC magnetron sputtered CoCr thin films. The coercivity of the deposited CoCr thin films were nearly independent of the deposition rate over the range from 11Å/sec to 55Å/sec. The surface micrographs of the films reveal that the thermal conductive property of the substrate plays a crucial role in affecting the microstructure and that it affected such magnetic properties as Hc(\perp) . CoCr films grown on cover glass exhibited larger grains and films on Al and NiP (on Al) substrates exhibited the smallest grains while films grown on Si wafers exhibited inbetween grain diameters. CoCr films with the smallest grains (on Al and NiP substrates) exhibited the largest Mr(\perp)/Mr(\parellel) ratio and also the smallest Δθ 50 .
ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.1986.1064627