Multiple scale integrated modeling of deposition processes: Process and materials modeling in IC fabrication
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| Veröffentlicht in: | Thin solid films 2000, Vol.365 (2), p.368-375 |
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| container_end_page | 375 |
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| container_issue | 2 |
| container_start_page | 368 |
| container_title | Thin solid films |
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| creator | MERCHANT, Tushar P GOBBERT, Matthias K CALE, Timothy S BORUCKI, Leonard J |
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| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 2000, Vol.365 (2), p.368-375 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_792879 |
| source | Access via ScienceDirect (Elsevier) |
| subjects | Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Deposition technology Electronics Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Theory and models of film growth |
| title | Multiple scale integrated modeling of deposition processes: Process and materials modeling in IC fabrication |
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