Multiple scale integrated modeling of deposition processes: Process and materials modeling in IC fabrication

Multiple scale integrated modeling of deposition processes: Process and materials modeling in IC fabrication

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Veröffentlicht in:Thin solid films 2000, Vol.365 (2), p.368-375
Hauptverfasser: MERCHANT, Tushar P, GOBBERT, Matthias K, CALE, Timothy S, BORUCKI, Leonard J
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Deposition technology
Electronics
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Microelectronic fabrication (materials and surfaces technology)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Theory and models of film growth
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ISSN:0040-6090
1879-2731