Characterization of ultrathin dielectrics grown by microwave afterglow oxygen and N2O plasma
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| Veröffentlicht in: | Japanese journal of applied physics 1995, Vol.34 (2B), p.973-977 |
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| Sprache: | eng |
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| container_end_page | 977 |
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| container_issue | 2B |
| container_start_page | 973 |
| container_title | Japanese journal of applied physics |
| container_volume | 34 |
| creator | PO-CHING CHEN YUNG-JANE HSU, K JIAN-YANG LIN HUEY-LIANT HWANG LIN |
| description | |
| doi_str_mv | 10.1143/JJAP.34.973 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese journal of applied physics, 1995, Vol.34 (2B), p.973-977 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_3469214 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Dielectric thin films Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Characterization of ultrathin dielectrics grown by microwave afterglow oxygen and N2O plasma |
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