Characterization of ultrathin dielectrics grown by microwave afterglow oxygen and N2O plasma

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Bibliographische Detailangaben
Veröffentlicht in:	Japanese journal of applied physics 1995, Vol.34 (2B), p.973-977
Hauptverfasser:	PO-CHING CHEN, YUNG-JANE HSU, K, JIAN-YANG LIN, HUEY-LIANT HWANG, LIN
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Dielectric thin films Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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