Low temperature deposition of (Ba, Sr)TiO3 films by electron cyclotron resonance plasma chemical vapor deposition

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Veröffentlicht in:	Japanese journal of applied physics 1996, Vol.35 (9B), p.5089-5093
Hauptverfasser:	SONE, S, YABUTA, H, KATO, Y, IIZUKA, T, YAMAMICHI, S, YAMAGUCHI, H, LESAICHERRE, P.-Y, NISHIMOTO, S, YOSHIDA, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Dielectric properties of solids and liquids Dielectric, piezoelectric, ferroelectric and antiferroelectric materials Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Niobates, titanates, tantalates, pzt ceramics, etc Permittivity (dielectric function) Physics
Online-Zugang:	Volltext
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