container_end_page 4895
container_issue 9B
container_start_page 4890
container_title Japanese journal of applied physics
container_volume 35
creator KANG, C. S
HWANG, C. S
CHO, H.-J
LEE, B. T
PARK, S. O
KIM, J. W
HORII, H
LEE, S. I
KOH, Y. B
LEE, M. Y
description
doi_str_mv 10.1143/jjap.35.4890
format Article
fullrecord <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_3258593</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3258593</sourcerecordid><originalsourceid>FETCH-LOGICAL-j305t-ccd3ee3576c4dce999f1b8839a043ff6b148d96cd19486c217433e8324f67ae33</originalsourceid><addsrcrecordid>eNo1jstOwzAURC0EEqWw4wO8YAGLlDjXSewlKk-pqEgUtpVrX1NHSWzsFKkfwH9TXqvRWcyZIeSU5RPGOFw2jQoTKCdcyHyPjBjwOuN5Ve6TUZ4XLOOyKA7JUUrNDquSsxH5fIoYVFSD8z1VvaHYoh6i06qlIfqAcXCYqLf0OS7cHOiwdj21ru0SNRh8cgMautrS1r1vnKHJb6JG2uGg2szHN9U7TfUaux_jhwo-_ve-F88f59PX64tjcmBVm_DkL8fk5fZmMb3PZvO7h-nVLGsgL4dMawOIUNaV5kajlNKylRAgVc7B2mrFuDCy0oZJLipdsJoDoICC26pWCDAmZ7_eoNLuj42q1y4tQ3SditslFKUoJcAXbmZk_w</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>KANG, C. S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. Y</creator><creatorcontrib>KANG, C. S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. Y</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.35.4890</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Acoustic wave devices, piezoelectric and piezoresistive devices ; Applied sciences ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Dielectric properties of solids and liquids ; Dielectric, ferroelectric, and piezoelectric devices ; Dielectric, piezoelectric, ferroelectric and antiferroelectric materials ; Dielectrics, piezoelectrics, and ferroelectrics and their properties ; Electronics ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Niobates, titanates, tantalates, pzt ceramics, etc ; Permittivity (dielectric function) ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>Japanese journal of applied physics, 1996, Vol.35 (9B), p.4890-4895</ispartof><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>310,311,782,786,791,792,4052,4053,23937,23938,25147,27932</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=3258593$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>KANG, C. S</creatorcontrib><creatorcontrib>HWANG, C. S</creatorcontrib><creatorcontrib>CHO, H.-J</creatorcontrib><creatorcontrib>LEE, B. T</creatorcontrib><creatorcontrib>PARK, S. O</creatorcontrib><creatorcontrib>KIM, J. W</creatorcontrib><creatorcontrib>HORII, H</creatorcontrib><creatorcontrib>LEE, S. I</creatorcontrib><creatorcontrib>KOH, Y. B</creatorcontrib><creatorcontrib>LEE, M. Y</creatorcontrib><title>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</title><title>Japanese journal of applied physics</title><subject>Acoustic wave devices, piezoelectric and piezoresistive devices</subject><subject>Applied sciences</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Dielectric properties of solids and liquids</subject><subject>Dielectric, ferroelectric, and piezoelectric devices</subject><subject>Dielectric, piezoelectric, ferroelectric and antiferroelectric materials</subject><subject>Dielectrics, piezoelectrics, and ferroelectrics and their properties</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Niobates, titanates, tantalates, pzt ceramics, etc</subject><subject>Permittivity (dielectric function)</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNo1jstOwzAURC0EEqWw4wO8YAGLlDjXSewlKk-pqEgUtpVrX1NHSWzsFKkfwH9TXqvRWcyZIeSU5RPGOFw2jQoTKCdcyHyPjBjwOuN5Ve6TUZ4XLOOyKA7JUUrNDquSsxH5fIoYVFSD8z1VvaHYoh6i06qlIfqAcXCYqLf0OS7cHOiwdj21ru0SNRh8cgMautrS1r1vnKHJb6JG2uGg2szHN9U7TfUaux_jhwo-_ve-F88f59PX64tjcmBVm_DkL8fk5fZmMb3PZvO7h-nVLGsgL4dMawOIUNaV5kajlNKylRAgVc7B2mrFuDCy0oZJLipdsJoDoICC26pWCDAmZ7_eoNLuj42q1y4tQ3SditslFKUoJcAXbmZk_w</recordid><startdate>1996</startdate><enddate>1996</enddate><creator>KANG, C. S</creator><creator>HWANG, C. S</creator><creator>CHO, H.-J</creator><creator>LEE, B. T</creator><creator>PARK, S. O</creator><creator>KIM, J. W</creator><creator>HORII, H</creator><creator>LEE, S. I</creator><creator>KOH, Y. B</creator><creator>LEE, M. Y</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope></search><sort><creationdate>1996</creationdate><title>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</title><author>KANG, C. S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. Y</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-j305t-ccd3ee3576c4dce999f1b8839a043ff6b148d96cd19486c217433e8324f67ae33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>Acoustic wave devices, piezoelectric and piezoresistive devices</topic><topic>Applied sciences</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Dielectric properties of solids and liquids</topic><topic>Dielectric, ferroelectric, and piezoelectric devices</topic><topic>Dielectric, piezoelectric, ferroelectric and antiferroelectric materials</topic><topic>Dielectrics, piezoelectrics, and ferroelectrics and their properties</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Niobates, titanates, tantalates, pzt ceramics, etc</topic><topic>Permittivity (dielectric function)</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KANG, C. S</creatorcontrib><creatorcontrib>HWANG, C. S</creatorcontrib><creatorcontrib>CHO, H.-J</creatorcontrib><creatorcontrib>LEE, B. T</creatorcontrib><creatorcontrib>PARK, S. O</creatorcontrib><creatorcontrib>KIM, J. W</creatorcontrib><creatorcontrib>HORII, H</creatorcontrib><creatorcontrib>LEE, S. I</creatorcontrib><creatorcontrib>KOH, Y. B</creatorcontrib><creatorcontrib>LEE, M. Y</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Japanese journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KANG, C. S</au><au>HWANG, C. S</au><au>CHO, H.-J</au><au>LEE, B. T</au><au>PARK, S. O</au><au>KIM, J. W</au><au>HORII, H</au><au>LEE, S. I</au><au>KOH, Y. B</au><au>LEE, M. Y</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</atitle><jtitle>Japanese journal of applied physics</jtitle><date>1996</date><risdate>1996</risdate><volume>35</volume><issue>9B</issue><spage>4890</spage><epage>4895</epage><pages>4890-4895</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.35.4890</doi><tpages>6</tpages></addata></record>
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ispartof Japanese journal of applied physics, 1996, Vol.35 (9B), p.4890-4895
issn 0021-4922
1347-4065
language eng
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Acoustic wave devices, piezoelectric and piezoresistive devices
Applied sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Dielectric properties of solids and liquids
Dielectric, ferroelectric, and piezoelectric devices
Dielectric, piezoelectric, ferroelectric and antiferroelectric materials
Dielectrics, piezoelectrics, and ferroelectrics and their properties
Electronics
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Niobates, titanates, tantalates, pzt ceramics, etc
Permittivity (dielectric function)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-05T20%3A45%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Preparation%20and%20electrical%20properties%20of%20SrTiO3%20thin%20films%20deposited%20by%20liquid%20source%20metal-organic%20chemical%20vapor%20deposition%20(MOCVD)&rft.jtitle=Japanese%20journal%20of%20applied%20physics&rft.au=KANG,%20C.%20S&rft.date=1996&rft.volume=35&rft.issue=9B&rft.spage=4890&rft.epage=4895&rft.pages=4890-4895&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.35.4890&rft_dat=%3Cpascalfrancis%3E3258593%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true