Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)
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Veröffentlicht in: | Japanese journal of applied physics 1996, Vol.35 (9B), p.4890-4895 |
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container_issue | 9B |
container_start_page | 4890 |
container_title | Japanese journal of applied physics |
container_volume | 35 |
creator | KANG, C. S HWANG, C. S CHO, H.-J LEE, B. T PARK, S. O KIM, J. W HORII, H LEE, S. I KOH, Y. B LEE, M. Y |
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doi_str_mv | 10.1143/jjap.35.4890 |
format | Article |
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S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. Y</creator><creatorcontrib>KANG, C. S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. Y</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.35.4890</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Acoustic wave devices, piezoelectric and piezoresistive devices ; Applied sciences ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Dielectric properties of solids and liquids ; Dielectric, ferroelectric, and piezoelectric devices ; Dielectric, piezoelectric, ferroelectric and antiferroelectric materials ; Dielectrics, piezoelectrics, and ferroelectrics and their properties ; Electronics ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Niobates, titanates, tantalates, pzt ceramics, etc ; Permittivity (dielectric function) ; Physics ; Semiconductor electronics. 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Y</creatorcontrib><title>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</title><title>Japanese journal of applied physics</title><subject>Acoustic wave devices, piezoelectric and piezoresistive devices</subject><subject>Applied sciences</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Dielectric properties of solids and liquids</subject><subject>Dielectric, ferroelectric, and piezoelectric devices</subject><subject>Dielectric, piezoelectric, ferroelectric and antiferroelectric materials</subject><subject>Dielectrics, piezoelectrics, and ferroelectrics and their properties</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Niobates, titanates, tantalates, pzt ceramics, etc</subject><subject>Permittivity (dielectric function)</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNo1jstOwzAURC0EEqWw4wO8YAGLlDjXSewlKk-pqEgUtpVrX1NHSWzsFKkfwH9TXqvRWcyZIeSU5RPGOFw2jQoTKCdcyHyPjBjwOuN5Ve6TUZ4XLOOyKA7JUUrNDquSsxH5fIoYVFSD8z1VvaHYoh6i06qlIfqAcXCYqLf0OS7cHOiwdj21ru0SNRh8cgMautrS1r1vnKHJb6JG2uGg2szHN9U7TfUaux_jhwo-_ve-F88f59PX64tjcmBVm_DkL8fk5fZmMb3PZvO7h-nVLGsgL4dMawOIUNaV5kajlNKylRAgVc7B2mrFuDCy0oZJLipdsJoDoICC26pWCDAmZ7_eoNLuj42q1y4tQ3SditslFKUoJcAXbmZk_w</recordid><startdate>1996</startdate><enddate>1996</enddate><creator>KANG, C. S</creator><creator>HWANG, C. S</creator><creator>CHO, H.-J</creator><creator>LEE, B. T</creator><creator>PARK, S. O</creator><creator>KIM, J. W</creator><creator>HORII, H</creator><creator>LEE, S. I</creator><creator>KOH, Y. B</creator><creator>LEE, M. Y</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope></search><sort><creationdate>1996</creationdate><title>Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD)</title><author>KANG, C. S ; HWANG, C. S ; CHO, H.-J ; LEE, B. T ; PARK, S. O ; KIM, J. W ; HORII, H ; LEE, S. I ; KOH, Y. B ; LEE, M. 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language | eng |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Acoustic wave devices, piezoelectric and piezoresistive devices Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Dielectric properties of solids and liquids Dielectric, ferroelectric, and piezoelectric devices Dielectric, piezoelectric, ferroelectric and antiferroelectric materials Dielectrics, piezoelectrics, and ferroelectrics and their properties Electronics Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Niobates, titanates, tantalates, pzt ceramics, etc Permittivity (dielectric function) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD) |
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