Boron carbonitride thin films by PACVD of single-source precursors

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Advanced materials (Weinheim) 1997-10, Vol.9 (12), p.257-262
Hauptverfasser:	HEGEMANN, D, RIEDEL, R, DRESSLER, W, OEHR, C, SCHINDLER, B, BRUNNER, H
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page	262
container_issue	12
container_start_page	257
container_title	Advanced materials (Weinheim)
container_volume	9
creator	HEGEMANN, D RIEDEL, R DRESSLER, W OEHR, C SCHINDLER, B BRUNNER, H
description
format	Article
fullrecord	<record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_2858531</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2858531</sourcerecordid><originalsourceid>FETCH-LOGICAL-p97t-9994158f3069274a1912cf2a1db91d6a94dff784c62713fad780fc328783f9fc3</originalsourceid><addsrcrecordid>eNotzLtOwzAUgGELUYnQ8g4eWC35bp-xDVepEgwVa-U4OWCUxpGdDn17kGD6v-m_Io0wUjDNwVyThoMyDKz2N-S21m_OOVhuG7Lb5ZInGkPp8pSWkvqBLl9popjGU6Xdhb5v248HmpHWNH2OA6v5XOJA5zLEc6m51A1ZYRjrcPffNTk8PR7aF7Z_e35tt3s2g1sYAGhhPCpuQTodBAgZUQbRdyB6G0D3iM7raKUTCkPvPMeopHdeIfxqTe7_tnOoMYxYwhRTPc4lnUK5HKU33iihfgA6iEbu</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Boron carbonitride thin films by PACVD of single-source precursors</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>HEGEMANN, D ; RIEDEL, R ; DRESSLER, W ; OEHR, C ; SCHINDLER, B ; BRUNNER, H</creator><creatorcontrib>HEGEMANN, D ; RIEDEL, R ; DRESSLER, W ; OEHR, C ; SCHINDLER, B ; BRUNNER, H</creatorcontrib><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><language>eng</language><publisher>Weinheim: Wiley</publisher><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Advanced materials (Weinheim), 1997-10, Vol.9 (12), p.257-262</ispartof><rights>1997 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2858531$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>HEGEMANN, D</creatorcontrib><creatorcontrib>RIEDEL, R</creatorcontrib><creatorcontrib>DRESSLER, W</creatorcontrib><creatorcontrib>OEHR, C</creatorcontrib><creatorcontrib>SCHINDLER, B</creatorcontrib><creatorcontrib>BRUNNER, H</creatorcontrib><title>Boron carbonitride thin films by PACVD of single-source precursors</title><title>Advanced materials (Weinheim)</title><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNotzLtOwzAUgGELUYnQ8g4eWC35bp-xDVepEgwVa-U4OWCUxpGdDn17kGD6v-m_Io0wUjDNwVyThoMyDKz2N-S21m_OOVhuG7Lb5ZInGkPp8pSWkvqBLl9popjGU6Xdhb5v248HmpHWNH2OA6v5XOJA5zLEc6m51A1ZYRjrcPffNTk8PR7aF7Z_e35tt3s2g1sYAGhhPCpuQTodBAgZUQbRdyB6G0D3iM7raKUTCkPvPMeopHdeIfxqTe7_tnOoMYxYwhRTPc4lnUK5HKU33iihfgA6iEbu</recordid><startdate>19971001</startdate><enddate>19971001</enddate><creator>HEGEMANN, D</creator><creator>RIEDEL, R</creator><creator>DRESSLER, W</creator><creator>OEHR, C</creator><creator>SCHINDLER, B</creator><creator>BRUNNER, H</creator><general>Wiley</general><scope>IQODW</scope></search><sort><creationdate>19971001</creationdate><title>Boron carbonitride thin films by PACVD of single-source precursors</title><author>HEGEMANN, D ; RIEDEL, R ; DRESSLER, W ; OEHR, C ; SCHINDLER, B ; BRUNNER, H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p97t-9994158f3069274a1912cf2a1db91d6a94dff784c62713fad780fc328783f9fc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>HEGEMANN, D</creatorcontrib><creatorcontrib>RIEDEL, R</creatorcontrib><creatorcontrib>DRESSLER, W</creatorcontrib><creatorcontrib>OEHR, C</creatorcontrib><creatorcontrib>SCHINDLER, B</creatorcontrib><creatorcontrib>BRUNNER, H</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>HEGEMANN, D</au><au>RIEDEL, R</au><au>DRESSLER, W</au><au>OEHR, C</au><au>SCHINDLER, B</au><au>BRUNNER, H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Boron carbonitride thin films by PACVD of single-source precursors</atitle><jtitle>Advanced materials (Weinheim)</jtitle><date>1997-10-01</date><risdate>1997</risdate><volume>9</volume><issue>12</issue><spage>257</spage><epage>262</epage><pages>257-262</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><cop>Weinheim</cop><pub>Wiley</pub><tpages>6</tpages></addata></record>
fulltext	fulltext
identifier	ISSN: 0935-9648
ispartof	Advanced materials (Weinheim), 1997-10, Vol.9 (12), p.257-262
issn	0935-9648 1521-4095
language	eng
recordid	cdi_pascalfrancis_primary_2858531
source	Wiley Online Library Journals Frontfile Complete
subjects	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
title	Boron carbonitride thin films by PACVD of single-source precursors
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T17%3A58%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Boron%20carbonitride%20thin%20films%20by%20PACVD%20of%20single-source%20precursors&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=HEGEMANN,%20D&rft.date=1997-10-01&rft.volume=9&rft.issue=12&rft.spage=257&rft.epage=262&rft.pages=257-262&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E2858531%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true