A high-performance AlInAs/InGaAs/InP DHBT K-band power cell
In this work the device design and power performance of several AlInAs/InGaAs/InP double heterojunction bipolar transistors (DHBTs) are reported for 18 GHz. The power cells utilize a wet chemical etching technique to create a micro-airbridge base connection and to remove extrinsic collector material...
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Veröffentlicht in: | IEEE microwave and guided wave letters 1997-10, Vol.7 (10), p.323-325 |
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Sprache: | eng |
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Zusammenfassung: | In this work the device design and power performance of several AlInAs/InGaAs/InP double heterojunction bipolar transistors (DHBTs) are reported for 18 GHz. The power cells utilize a wet chemical etching technique to create a micro-airbridge base connection and to remove extrinsic collector material from beneath the base which both contribute to a reduced base-collector capacitance and improved f max and power gain. For class B operation, the eight-finger 2 μm×30 μm power cells achieved 1.17-W output power, which indicates 4.88-W/mm emitter length, with 54% power-added efficiency (PAE) and 7.3-dB gain, This is believed to be the best combination of PAE and output power reported for this power density at K-band frequencies. |
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ISSN: | 1051-8207 1558-2329 |
DOI: | 10.1109/75.631189 |