Improved Rear-Side Passivation by Atomic Layer Deposition Al2O3/SiNx Stack Layers for High VOC Industrial p-Type Silicon Solar Cells

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Veröffentlicht in:	IEEE electron device letters 2013, Vol.34 (9), p.1163-1165
Hauptverfasser:	LIN, Je-Wei, CHEN, Yi-Yang, GAN, Jon-Yiew, HSEIH, Wei-Ping, DU, Chen-Hsu, CHAO, Tien-Sheng
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Electronics Energy Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Natural energy Optoelectronic devices Photovoltaic conversion Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Solar cells. Photoelectrochemical cells Solar energy
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ISSN:	0741-3106 1558-0563