Forming Kinetics in HfO2-Based RRAM Cells
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Veröffentlicht in: | IEEE transactions on electron devices 2013, Vol.60 (1), p.438-443 |
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container_title | IEEE transactions on electron devices |
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creator | LORENZI, Paolo RAO, Rosario IRRERA, Fernanda |
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doi_str_mv | 10.1109/TED.2012.2227324 |
format | Article |
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issn | 0018-9383 1557-9646 |
language | eng |
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source | IEEE Electronic Library (IEL) |
subjects | Applied sciences Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuits Integrated circuits by function (including memories and processors) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Forming Kinetics in HfO2-Based RRAM Cells |
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