Chemically amplified deep UV resists for micromachining using electron beam lithography and dry etching

Bibliographische Detailangaben

Veröffentlicht in:	Sensors and materials 1998, Vol.10 (4), p.219-227
Hauptverfasser:	HUDEK, P, RANGELOW, I. W, KOSTIC, I, STANGL, G, GRABIEC, P. B, RANGELOW, E. W, BELOV, M, FENG SHI
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mechanical instruments, equipment and techniques Microelectronic fabrication (materials and surfaces technology) Micromechanical devices and systems Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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