Direct determination of threshold condition in DG-MOSFETs from the gm/ID curve

In this work we apply the current-based threshold voltage definition (equality between the drift and diffusion components of drain current) to intrinsic symmetric double-gate MOSFETs. We show that the half maximum point of the gm/ID (transconductance-to-current ratio) curve in the linear region corr...

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Veröffentlicht in:Solid-state electronics 2011-02, Vol.56 (1), p.89-94
Hauptverfasser: Cunha, Ana Isabela Araújo, Pavanello, Marcelo Antonio, Trevisoli, Renan Doria, Galup-Montoro, Carlos, Schneider, Marcio Cherem
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Sprache:eng
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Zusammenfassung:In this work we apply the current-based threshold voltage definition (equality between the drift and diffusion components of drain current) to intrinsic symmetric double-gate MOSFETs. We show that the half maximum point of the gm/ID (transconductance-to-current ratio) curve in the linear region corresponds exactly to the condition IDdrift=IDdiff when mobility variation is neglected. Numerical simulations show that the threshold voltages determined from the gm/ID curve and from the IDdrift=IDdiff condition differ by about ϕt/2 (one half of the thermal voltage) when considering realistic mobility variations. Simulation results show that the threshold voltages determined with the gm/ID procedure are close to those obtained with the Y (=ID/gm) function method for a considerable range of silicon film thicknesses, channel lengths, and temperature values. The current-based procedure has also been successfully applied experimentally to a FinFET over a wide temperature range.
ISSN:0038-1101
1879-2405
DOI:10.1016/j.sse.2010.10.011