fmax Improvement by Controlling Extrinsic Parasitics in Circuit-Level MOS Transistor

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Veröffentlicht in:IEEE electron device letters 2009-12, Vol.30 (12), p.1323-1325
Hauptverfasser: JHON, Hee-Sauk, LEE, Jae-Hong, LEE, Jaeho, OH, Byoungchan, SONG, Ickhyun, YEONAM YUN, PARK, Byung-Gook, LEE, Jong-Duk, SHIN, Hyungcheol
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container_title IEEE electron device letters
container_volume 30
creator JHON, Hee-Sauk
LEE, Jae-Hong
LEE, Jaeho
OH, Byoungchan
SONG, Ickhyun
YEONAM YUN
PARK, Byung-Gook
LEE, Jong-Duk
SHIN, Hyungcheol
description
doi_str_mv 10.1109/LED.2009.2032249
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source IEEE Electronic Library (IEL)
subjects Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
title fmax Improvement by Controlling Extrinsic Parasitics in Circuit-Level MOS Transistor
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