Chemical–Mechanical Polishing of CdTe and ZnxCd1−xTe Single Crystals by H2O2(HNO3)–HBr–Organic Solvent Etchant Compositions

Chemical–mechanical polishing of CdTe and Zn x Cd 1− x Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H 2 O 2 (HNO 3 )–HBr–solvent has been investigated. The dependences of the chemical–mechanical polishing rate on the dilution of the base polishing etchant...

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Hauptverfasser:	Tomashik, Z. F., Tomashik, V. M., Stratiychuk, I. B., Okrepka, G. M., Hnativ, I. I., Moravec, P., Höschl, P., Bok, J.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Characterization and Evaluation of Materials Chemistry and Materials Science Cross-disciplinary physics: materials science rheology Electronics Electronics and Microelectronics Exact sciences and technology Instrumentation Materials Materials Science Optical and Electronic Materials Physics Solid State Physics Surface treatments
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Beschreibung
Zusammenfassung:	Chemical–mechanical polishing of CdTe and Zn x Cd 1− x Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H 2 O 2 (HNO 3 )–HBr–solvent has been investigated. The dependences of the chemical–mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry. The polishing etchant compositions for CdTe and Zn x Cd 1− x Te single-crystal surfaces and the chemical polishing conditions have been optimized.
ISSN:	0361-5235 1543-186X
DOI:	10.1007/s11664-009-0692-8