Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching: Special Issue on Advances on Plasma Processing for Semiconductor Manufacturing

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Veröffentlicht in:	IEEE transactions on plasma science 2009, Vol.37 (9), p.1730-1746
Hauptverfasser:	BANNA, Samer, AGARWAL, Ankur, JUNHO YOON, KYOUNGSUB SHIN, CHOI, Sang-Jun, CHO, Han-Soo, KIM, Hyun-Joong, CHANGHUN LEE, LYMBEROPOULOS, Dimitris, TOKASHIKI, Ken, HONG CHO, RAUF, Shahid, TODOROW, Valentin, RAMASWAMY, Kartik, COLLINS, Ken, STOUT, Phillip, LEE, Jeong-Yun
Format:	Artikel
Sprache:	eng
Schlagworte:	Discharges for spectral sources (including inductively coupled plasmas) Electric and magnetic measurements Electric discharges Etching and cleaning Exact sciences and technology Monte carlo methods Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma diagnostic techniques and instrumentation Plasma simulation
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ISSN:	0093-3813 1939-9375