Influence of plasma treatments on the microstructure and electrophysical properties of SnOx thin films synthesized by magnetron sputtering and sol–gel technique
SnO x thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synth...
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| Veröffentlicht in: | Journal of materials science. Materials in electronics 2008-12, Vol.19 (Suppl 1), p.382-387 |
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| container_end_page | 387 |
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| container_issue | Suppl 1 |
| container_start_page | 382 |
| container_title | Journal of materials science. Materials in electronics |
| container_volume | 19 |
| creator | Mukhamedshina, D. M. Mit’, K. A. Beisenkhanov, N. B. Dmitriyeva, E. A. Valitova, I. V. |
| description | SnO
x
thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synthesized by the two methods were explained by absence of tin nanoparticles in films synthesized by the sol–gel technique. The structure of these films was more fine-grained in comparison to those deposited by magnetron sputtering. By analysis of optical transmission spectra and Х-ray diffraction data it was shown that the films synthesized by the sol–gel technique have higher porosity and a more uniform composition and as consequence a higher gas sensitivity. The influence of O-plasma and H-plasma treatments on the increase of sensitivity for both types of films is studied. |
| doi_str_mv | 10.1007/s10854-008-9695-0 |
| format | Article |
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x
thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synthesized by the two methods were explained by absence of tin nanoparticles in films synthesized by the sol–gel technique. The structure of these films was more fine-grained in comparison to those deposited by magnetron sputtering. By analysis of optical transmission spectra and Х-ray diffraction data it was shown that the films synthesized by the sol–gel technique have higher porosity and a more uniform composition and as consequence a higher gas sensitivity. The influence of O-plasma and H-plasma treatments on the increase of sensitivity for both types of films is studied.</description><identifier>ISSN: 0957-4522</identifier><identifier>EISSN: 1573-482X</identifier><identifier>DOI: 10.1007/s10854-008-9695-0</identifier><language>eng</language><publisher>Boston: Springer US</publisher><subject>Applied sciences ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Electronics ; Exact sciences and technology ; Materials ; Materials Science ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanoscale materials and structures: fabrication and characterization ; Optical and Electronic Materials ; Other topics in nanoscale materials and structures ; Physics ; Porous materials; granular materials ; Specific materials</subject><ispartof>Journal of materials science. Materials in electronics, 2008-12, Vol.19 (Suppl 1), p.382-387</ispartof><rights>Springer Science+Business Media, LLC 2008</rights><rights>2008 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s10854-008-9695-0$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s10854-008-9695-0$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925,41488,42557,51319</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=20818341$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mukhamedshina, D. M.</creatorcontrib><creatorcontrib>Mit’, K. A.</creatorcontrib><creatorcontrib>Beisenkhanov, N. B.</creatorcontrib><creatorcontrib>Dmitriyeva, E. A.</creatorcontrib><creatorcontrib>Valitova, I. V.</creatorcontrib><title>Influence of plasma treatments on the microstructure and electrophysical properties of SnOx thin films synthesized by magnetron sputtering and sol–gel technique</title><title>Journal of materials science. Materials in electronics</title><addtitle>J Mater Sci: Mater Electron</addtitle><description>SnO
x
thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synthesized by the two methods were explained by absence of tin nanoparticles in films synthesized by the sol–gel technique. The structure of these films was more fine-grained in comparison to those deposited by magnetron sputtering. By analysis of optical transmission spectra and Х-ray diffraction data it was shown that the films synthesized by the sol–gel technique have higher porosity and a more uniform composition and as consequence a higher gas sensitivity. The influence of O-plasma and H-plasma treatments on the increase of sensitivity for both types of films is studied.</description><subject>Applied sciences</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Materials</subject><subject>Materials Science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Optical and Electronic Materials</subject><subject>Other topics in nanoscale materials and structures</subject><subject>Physics</subject><subject>Porous materials; granular materials</subject><subject>Specific materials</subject><issn>0957-4522</issn><issn>1573-482X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNotkU1OHDEQhS2USEyAA7DzJstOynb_uJcRCgQJiUUSiZ1l3OUZo253x-WWGFa5AzfgaDlJPJmsqhbvfXpVj7FLAZ8EQPeZBOimrgB01bd9U8EJ24imU1Wt5cM7toG-6aq6kfKUfSB6AoC2VnrD3m6jH1eMDvns-TJamizPCW2eMGbic-R5h3wKLs2U0-rympDbOHAc0eU0L7s9BWdHvpQdUw5IB9L3eP9cnCFyH8aJOO1j4VB4wYE_7vlktxGLO3Ja1pwxhbj9R6V5_PP7dYsjz-h2Mfxa8Zy993YkvPg_z9jP668_rr5Vd_c3t1df7qpFNDpXqtUguto51I16xL7zgOhbGPxg-84K7WUvRT0o0UgsX1EgvPdti1K3rcdenbGPR-5iqRzkk40ukFlSmGzaGwlaaFWLopNHHS2H2JjM07ymWKIZAebQhjm2YUob5tCGAfUXeO6DnQ</recordid><startdate>20081201</startdate><enddate>20081201</enddate><creator>Mukhamedshina, D. 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M.</creatorcontrib><creatorcontrib>Mit’, K. A.</creatorcontrib><creatorcontrib>Beisenkhanov, N. B.</creatorcontrib><creatorcontrib>Dmitriyeva, E. A.</creatorcontrib><creatorcontrib>Valitova, I. V.</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Journal of materials science. Materials in electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mukhamedshina, D. M.</au><au>Mit’, K. A.</au><au>Beisenkhanov, N. B.</au><au>Dmitriyeva, E. A.</au><au>Valitova, I. V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of plasma treatments on the microstructure and electrophysical properties of SnOx thin films synthesized by magnetron sputtering and sol–gel technique</atitle><jtitle>Journal of materials science. Materials in electronics</jtitle><stitle>J Mater Sci: Mater Electron</stitle><date>2008-12-01</date><risdate>2008</risdate><volume>19</volume><issue>Suppl 1</issue><spage>382</spage><epage>387</epage><pages>382-387</pages><issn>0957-4522</issn><eissn>1573-482X</eissn><abstract>SnO
x
thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synthesized by the two methods were explained by absence of tin nanoparticles in films synthesized by the sol–gel technique. The structure of these films was more fine-grained in comparison to those deposited by magnetron sputtering. By analysis of optical transmission spectra and Х-ray diffraction data it was shown that the films synthesized by the sol–gel technique have higher porosity and a more uniform composition and as consequence a higher gas sensitivity. The influence of O-plasma and H-plasma treatments on the increase of sensitivity for both types of films is studied.</abstract><cop>Boston</cop><pub>Springer US</pub><doi>10.1007/s10854-008-9695-0</doi><tpages>6</tpages></addata></record> |
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| ispartof | Journal of materials science. Materials in electronics, 2008-12, Vol.19 (Suppl 1), p.382-387 |
| issn | 0957-4522 1573-482X |
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| source | SpringerNature Journals |
| subjects | Applied sciences Characterization and Evaluation of Materials Chemistry and Materials Science Cross-disciplinary physics: materials science rheology Deposition by sputtering Electronics Exact sciences and technology Materials Materials Science Methods of deposition of films and coatings film growth and epitaxy Nanoscale materials and structures: fabrication and characterization Optical and Electronic Materials Other topics in nanoscale materials and structures Physics Porous materials granular materials Specific materials |
| title | Influence of plasma treatments on the microstructure and electrophysical properties of SnOx thin films synthesized by magnetron sputtering and sol–gel technique |
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