Influence of plasma treatments on the microstructure and electrophysical properties of SnOx thin films synthesized by magnetron sputtering and sol–gel technique

SnO x thin films were synthesized by magnetron sputtering and sol–gel technique. Then films were treated by O- and H-plasmas. The structure, optical and electrophysical properties of films were analyzed. Differences between optical transmission spectra in the near infra-red region of the films synthesized by the two methods were explained by absence of tin nanoparticles in films synthesized by the sol–gel technique. The structure of these films was more fine-grained in comparison to those deposited by magnetron sputtering. By analysis of optical transmission spectra and Х-ray diffraction data it was shown that the films synthesized by the sol–gel technique have higher porosity and a more uniform composition and as consequence a higher gas sensitivity. The influence of O-plasma and H-plasma treatments on the increase of sensitivity for both types of films is studied.