Deposition characteristics of (Ba, Sr)TiO3 thin films by liquid source metal-organic chemical vapor deposition at low substrate temperatures

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Veröffentlicht in:	Japanese journal of applied physics 1997, Vol.36 (11), p.6946-6952
Hauptverfasser:	KANG, C. S, CHO, H.-J, HWANG, C. S, LEE, B. T, LEE, K.-H, HORII, H, KIM, W. D, LEE, S. I, LEE, M. Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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source	Institute of Physics Journals
subjects	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
title	Deposition characteristics of (Ba, Sr)TiO3 thin films by liquid source metal-organic chemical vapor deposition at low substrate temperatures
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