Microwave ZnO Thin-Film Transistors

We have developed ZnO thin-film transistor design and fabrication techniques to demonstrate microwave frequency operation with 2-mum gate length devices produced on GaAs substrates. Using SiO 2 gate insulator and pulsed laser deposited ZnO active layers, a drain-current ON/OFF ratio of 10 12 , a dra...

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Veröffentlicht in:IEEE electron device letters 2008-09, Vol.29 (9), p.1024-1026
Hauptverfasser: Bayraktaroglu, B., Leedy, K., Neidhard, R.
Format: Artikel
Sprache:eng
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Zusammenfassung:We have developed ZnO thin-film transistor design and fabrication techniques to demonstrate microwave frequency operation with 2-mum gate length devices produced on GaAs substrates. Using SiO 2 gate insulator and pulsed laser deposited ZnO active layers, a drain-current ON/OFF ratio of 10 12 , a drain-current density of 400 mA/mm, a field-effect mobility of 110 cm 2 /V ldr s, and a subthreshold gate voltage swing of 109 m\/dec were achieved. Devices with Ti-gate metal had current and power gain cutoff frequencies of 500 and 400 MHz, respectively.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2008.2001635