Transparent conductive Nb-doped TiO2 films deposited by direct-current magnetron sputtering using a TiO2-x target

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Bibliographische Detailangaben
Veröffentlicht in:	Thin solid films 2008-07, Vol.516 (17), p.5758-5762
Hauptverfasser:	SATO, Yasushi, AKIZUKI, Hideo, KAMIYAMA, Toshihisa, SHIGESATO, Yuzo
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Electrical properties of specific thin films Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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