Optical lithography : present and future challenges: Ultimate lithography
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| Veröffentlicht in: | Comptes rendus. Physique 2006, Vol.7 (8), p.858-874 |
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| container_title | Comptes rendus. Physique |
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| creator | LIN, Burn J |
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| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 1631-0705 |
| ispartof | Comptes rendus. Physique, 2006, Vol.7 (8), p.858-874 |
| issn | 1631-0705 1878-1535 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_18353467 |
| source | Elsevier ScienceDirect Journals; EZB-FREE-00999 freely available EZB journals; Alma/SFX Local Collection |
| subjects | Applied sciences Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuits Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | Optical lithography : present and future challenges: Ultimate lithography |
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