Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation: Special Issue of the Micromechanics Section of Sensors and Actuators, based on contributions revised from the Technical Digest of the Eleventh IEEE International Workshop on Micro Electro Mechanical Systems (MEMS-98), Heidelberg, Germany, 25-29 January 1998
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| Veröffentlicht in: | Sensors and actuators. A. Physical. 1999, Vol.73 (1-2), p.131-137 |
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| container_issue | 1-2 |
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| container_title | Sensors and actuators. A. Physical. |
| container_volume | 73 |
| creator | SATO, K SHIKIDA, M YAMASHIRO, T ASAUMI, K IRIYE, Y YAMAMOTO, M |
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| fulltext | fulltext |
| identifier | ISSN: 0924-4247 |
| ispartof | Sensors and actuators. A. Physical., 1999, Vol.73 (1-2), p.131-137 |
| issn | 0924-4247 1873-3069 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_1805899 |
| source | Elsevier ScienceDirect Journals Complete |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Surface cleaning, etching, patterning Surface treatments |
| title | Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation: Special Issue of the Micromechanics Section of Sensors and Actuators, based on contributions revised from the Technical Digest of the Eleventh IEEE International Workshop on Micro Electro Mechanical Systems (MEMS-98), Heidelberg, Germany, 25-29 January 1998 |
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