Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets
Gespeichert in:
| Veröffentlicht in: | Thin solid films 1999-07, Vol.348 (1-2), p.103-113 |
|---|---|
| Hauptverfasser: | , , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 113 |
|---|---|
| container_issue | 1-2 |
| container_start_page | 103 |
| container_title | Thin solid films |
| container_volume | 348 |
| creator | THÄRIGEN, T LIPPOLD, G SZARGAN, R RIEDE, V LORENZ, M KOIVUSAARI, K. J LORENZ, D MOSCH, S GRAU, P HESSE, R STREUBEL, P |
| description | |
| doi_str_mv | 10.1016/S0040-6090(99)00024-3 |
| format | Article |
| fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_1799605</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1799605</sourcerecordid><originalsourceid>FETCH-LOGICAL-p182t-46b81919c631f5642131c3205b1c26003f5388ccde533ef680380f931ccb12b53</originalsourceid><addsrcrecordid>eNo9jE1LAzEURYMoWKs_QcjChS5i30tm0mQpxVqhVLC6LpnMpI3MR0im0K761x1RXF2499xDyC3CIwLKyRogAyZBw73WDwDAMybOyAjVVDM-FXhORv_IJblK6WuAkHMxIqeFiSU1TRfDrtsnOlv7w-pI-51vqfN1k2hZhS75vippcaTvc9r6PnbbqqWhNqkx1KTk088c9nUaYmirSE1Rm953Le0cbfxh6LfRhN3gmay9WGWsN3Fb9emaXDgz_G7-ckw-588fswVbvr28zp6WLKDiPctkoVCjtlKgy2XGUaAVHPICLZcAwuVCKWvLKheiclKBUOD0ANkCeZGLMbn79QaTrKldNK31aROib0w8bnCqtYRcfANyiWKk</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets</title><source>Elsevier ScienceDirect Journals Complete</source><creator>THÄRIGEN, T ; LIPPOLD, G ; SZARGAN, R ; RIEDE, V ; LORENZ, M ; KOIVUSAARI, K. J ; LORENZ, D ; MOSCH, S ; GRAU, P ; HESSE, R ; STREUBEL, P</creator><creatorcontrib>THÄRIGEN, T ; LIPPOLD, G ; SZARGAN, R ; RIEDE, V ; LORENZ, M ; KOIVUSAARI, K. J ; LORENZ, D ; MOSCH, S ; GRAU, P ; HESSE, R ; STREUBEL, P</creatorcontrib><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(99)00024-3</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier Science</publisher><subject>Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Laser deposition ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Thin solid films, 1999-07, Vol.348 (1-2), p.103-113</ispartof><rights>1999 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1799605$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>THÄRIGEN, T</creatorcontrib><creatorcontrib>LIPPOLD, G</creatorcontrib><creatorcontrib>SZARGAN, R</creatorcontrib><creatorcontrib>RIEDE, V</creatorcontrib><creatorcontrib>LORENZ, M</creatorcontrib><creatorcontrib>KOIVUSAARI, K. J</creatorcontrib><creatorcontrib>LORENZ, D</creatorcontrib><creatorcontrib>MOSCH, S</creatorcontrib><creatorcontrib>GRAU, P</creatorcontrib><creatorcontrib>HESSE, R</creatorcontrib><creatorcontrib>STREUBEL, P</creatorcontrib><title>Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets</title><title>Thin solid films</title><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Laser deposition</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNo9jE1LAzEURYMoWKs_QcjChS5i30tm0mQpxVqhVLC6LpnMpI3MR0im0K761x1RXF2499xDyC3CIwLKyRogAyZBw73WDwDAMybOyAjVVDM-FXhORv_IJblK6WuAkHMxIqeFiSU1TRfDrtsnOlv7w-pI-51vqfN1k2hZhS75vippcaTvc9r6PnbbqqWhNqkx1KTk088c9nUaYmirSE1Rm953Le0cbfxh6LfRhN3gmay9WGWsN3Fb9emaXDgz_G7-ckw-588fswVbvr28zp6WLKDiPctkoVCjtlKgy2XGUaAVHPICLZcAwuVCKWvLKheiclKBUOD0ANkCeZGLMbn79QaTrKldNK31aROib0w8bnCqtYRcfANyiWKk</recordid><startdate>19990706</startdate><enddate>19990706</enddate><creator>THÄRIGEN, T</creator><creator>LIPPOLD, G</creator><creator>SZARGAN, R</creator><creator>RIEDE, V</creator><creator>LORENZ, M</creator><creator>KOIVUSAARI, K. J</creator><creator>LORENZ, D</creator><creator>MOSCH, S</creator><creator>GRAU, P</creator><creator>HESSE, R</creator><creator>STREUBEL, P</creator><general>Elsevier Science</general><scope>IQODW</scope></search><sort><creationdate>19990706</creationdate><title>Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets</title><author>THÄRIGEN, T ; LIPPOLD, G ; SZARGAN, R ; RIEDE, V ; LORENZ, M ; KOIVUSAARI, K. J ; LORENZ, D ; MOSCH, S ; GRAU, P ; HESSE, R ; STREUBEL, P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p182t-46b81919c631f5642131c3205b1c26003f5388ccde533ef680380f931ccb12b53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Laser deposition</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>THÄRIGEN, T</creatorcontrib><creatorcontrib>LIPPOLD, G</creatorcontrib><creatorcontrib>SZARGAN, R</creatorcontrib><creatorcontrib>RIEDE, V</creatorcontrib><creatorcontrib>LORENZ, M</creatorcontrib><creatorcontrib>KOIVUSAARI, K. J</creatorcontrib><creatorcontrib>LORENZ, D</creatorcontrib><creatorcontrib>MOSCH, S</creatorcontrib><creatorcontrib>GRAU, P</creatorcontrib><creatorcontrib>HESSE, R</creatorcontrib><creatorcontrib>STREUBEL, P</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>THÄRIGEN, T</au><au>LIPPOLD, G</au><au>SZARGAN, R</au><au>RIEDE, V</au><au>LORENZ, M</au><au>KOIVUSAARI, K. J</au><au>LORENZ, D</au><au>MOSCH, S</au><au>GRAU, P</au><au>HESSE, R</au><au>STREUBEL, P</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets</atitle><jtitle>Thin solid films</jtitle><date>1999-07-06</date><risdate>1999</risdate><volume>348</volume><issue>1-2</issue><spage>103</spage><epage>113</epage><pages>103-113</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><cop>Lausanne</cop><pub>Elsevier Science</pub><doi>10.1016/S0040-6090(99)00024-3</doi><tpages>11</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 1999-07, Vol.348 (1-2), p.103-113 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_1799605 |
| source | Elsevier ScienceDirect Journals Complete |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4-targets |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T06%3A58%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Hard%20amorphous%20CSixNy%20thin%20films%20deposited%20by%20RF%20nitrogen%20plasma%20assisted%20pulsed%20laser%20ablation%20of%20mixed%20graphite/Si3N4-targets&rft.jtitle=Thin%20solid%20films&rft.au=TH%C3%84RIGEN,%20T&rft.date=1999-07-06&rft.volume=348&rft.issue=1-2&rft.spage=103&rft.epage=113&rft.pages=103-113&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/S0040-6090(99)00024-3&rft_dat=%3Cpascalfrancis%3E1799605%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |