Step and flash nanoimprint lithography in Europe

Nanoimprint lithography is a technology which has been developed during the last decade for achieving structures in the nanometer range. The authors show a short overview of the mainstream processes and work out the advantages of the step and flash imprint lithography (S-FIL). Process results reache...

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Bibliographische Detailangaben
Hauptverfasser: Schulz, H., Pavlicek, H., Reng, N.
Format: Tagungsbericht
Sprache:eng
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