Step and flash nanoimprint lithography in Europe

Nanoimprint lithography is a technology which has been developed during the last decade for achieving structures in the nanometer range. The authors show a short overview of the mainstream processes and work out the advantages of the step and flash imprint lithography (S-FIL). Process results reache...

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Hauptverfasser:	Schulz, H., Pavlicek, H., Reng, N.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Costs Electronics Embossing Europe Exact sciences and technology Lithography Microelectronic fabrication (materials and surfaces technology) Nanolithography Polymers Resins Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Tellurium Temperature
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Beschreibung
Zusammenfassung:	Nanoimprint lithography is a technology which has been developed during the last decade for achieving structures in the nanometer range. The authors show a short overview of the mainstream processes and work out the advantages of the step and flash imprint lithography (S-FIL). Process results reached at Molecular Imprint Inc. (MII), Austin, Texas, confirm these theses. A comparison is done between optical lithography and the different imprint techniques. Thereby (S-FIL) is the most attractive technology enabling low cost lithography in the nanometer range.
DOI:	10.1109/NANO.2004.1392451