Electron beam lithography and liftoff of molecules and DNA rafts
Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with...
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creator | Bernstein, G.H. Wenchuang Hu Qingling Hang Sarveswaran, K. Lieberman, M. |
description | Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with resolution to about 15 nm. In addition, DNA rafts are patterned with high fidelity at linewidths of about 100 nm. This technique can be applied to molecular patterning in general, and quantum-dot cellular automata (QCA) in particular. |
doi_str_mv | 10.1109/NANO.2004.1392297 |
format | Conference Proceeding |
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Turing machines</subject><subject>Chemistry</subject><subject>Circuit properties</subject><subject>Computer science; control theory; systems</subject><subject>Digital circuits</subject><subject>DNA</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electron beams</subject><subject>Electronic circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Lithography</subject><subject>Manufacturing</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Molecular electronics</subject><subject>Molecular electronics, nanoelectronics</subject><subject>Quantum cellular automata</subject><subject>Quantum dots</subject><subject>Self-assembly</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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identifier | ISBN: 0780385365 |
ispartof | 2004 4th IEEE Conference on Nanotechnology : Munich, Germany, 16-19 August, 2004, 2004, p.201-203 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Applied sciences Assembly Automata. Abstract machines. Turing machines Chemistry Circuit properties Computer science control theory systems Digital circuits DNA Electric, optical and optoelectronic circuits Electron beams Electronic circuits Electronics Exact sciences and technology Lithography Manufacturing Microelectronic fabrication (materials and surfaces technology) Molecular electronics Molecular electronics, nanoelectronics Quantum cellular automata Quantum dots Self-assembly Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Theoretical computing |
title | Electron beam lithography and liftoff of molecules and DNA rafts |
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