Electron beam lithography and liftoff of molecules and DNA rafts

Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with...

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Hauptverfasser: Bernstein, G.H., Wenchuang Hu, Qingling Hang, Sarveswaran, K., Lieberman, M.
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Wenchuang Hu
Qingling Hang
Sarveswaran, K.
Lieberman, M.
description Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with resolution to about 15 nm. In addition, DNA rafts are patterned with high fidelity at linewidths of about 100 nm. This technique can be applied to molecular patterning in general, and quantum-dot cellular automata (QCA) in particular.
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Applied sciences
Assembly
Automata. Abstract machines. Turing machines
Chemistry
Circuit properties
Computer science
control theory
systems
Digital circuits
DNA
Electric, optical and optoelectronic circuits
Electron beams
Electronic circuits
Electronics
Exact sciences and technology
Lithography
Manufacturing
Microelectronic fabrication (materials and surfaces technology)
Molecular electronics
Molecular electronics, nanoelectronics
Quantum cellular automata
Quantum dots
Self-assembly
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Theoretical computing
title Electron beam lithography and liftoff of molecules and DNA rafts
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