Electron beam lithography and liftoff of molecules and DNA rafts

Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Bernstein, G.H., Wenchuang Hu, Qingling Hang, Sarveswaran, K., Lieberman, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Assembly Automata. Abstract machines. Turing machines Chemistry Circuit properties Computer science control theory systems Digital circuits DNA Electric, optical and optoelectronic circuits Electron beams Electronic circuits Electronics Exact sciences and technology Lithography Manufacturing Microelectronic fabrication (materials and surfaces technology) Molecular electronics Molecular electronics, nanoelectronics Quantum cellular automata Quantum dots Self-assembly Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Theoretical computing
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Electron beam lithography patterning of polymethylmethacrylate (PMMA) is a versatile tool for defining molecular structures on the sub-10 nm scale. We demonstrate lithographic resolution to about 5 nm using a cold development technique. Narrow trenches are used to pattern Creutz-Taube molecules with resolution to about 15 nm. In addition, DNA rafts are patterned with high fidelity at linewidths of about 100 nm. This technique can be applied to molecular patterning in general, and quantum-dot cellular automata (QCA) in particular.
DOI:	10.1109/NANO.2004.1392297