Electron release in the afterglow of a pulsed inductively-coupled radiofrequency oxygen plasma
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| Veröffentlicht in: | Plasma sources science & technology 2006-05, Vol.15 (2), p.171-177 |
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| container_end_page | 177 |
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| container_issue | 2 |
| container_start_page | 171 |
| container_title | Plasma sources science & technology |
| container_volume | 15 |
| creator | Brockhaus, A Leu, G F Selenin, V Tarnev, Kh Engemann, J |
| description | |
| doi_str_mv | 10.1088/0963-0252/15/2/001 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0963-0252 |
| ispartof | Plasma sources science & technology, 2006-05, Vol.15 (2), p.171-177 |
| issn | 0963-0252 1361-6595 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_17772900 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Discharges for spectral sources (including inductively coupled plasma) Discharges for spectral sources (including inductively coupled plasmas) Electric discharges Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma diagnostic techniques and instrumentation Radio-frequency and microwave measurements |
| title | Electron release in the afterglow of a pulsed inductively-coupled radiofrequency oxygen plasma |
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