Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic : Extreme ultraviolet coherent sources and applications
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| Veröffentlicht in: | IEEE journal of quantum electronics 2006, Vol.42 (1-2), p.44-50 |
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| container_end_page | 50 |
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| container_issue | 1-2 |
| container_start_page | 44 |
| container_title | IEEE journal of quantum electronics |
| container_volume | 42 |
| creator | NAULLEAU, Patrick GOLDBERG, Kenneth A CAIN, Jason P ANDERSON, Erik H DEAN, Kim R DENHAM, Paul HOEF, Brian JACKSON, Keith H |
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| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0018-9197 |
| ispartof | IEEE journal of quantum electronics, 2006, Vol.42 (1-2), p.44-50 |
| issn | 0018-9197 1558-1713 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_17481301 |
| source | IEEE Electronic Library (IEL) |
| subjects | Applied sciences Electronics Exact sciences and technology Fundamental areas of phenomenology (including applications) Interfaces Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Optical sources and standards Optics Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Visible and ultraviolet sources |
| title | Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic : Extreme ultraviolet coherent sources and applications |
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