Simultaneous measurement of wafer curvature and true temperature during metalorganic growth of group-III nitrides on silicon and sapphire : Advanced optical diagnostics of surfaces, nanostructures and ultrathin films

Bibliographische Detailangaben

Hauptverfasser:	KROST, A, SCHULZE, F, DADGAR, A, STRASSBURGER, G, HABERLAND, K, ZETTLER, T
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Materials testing Methods of deposition of films and coatings film growth and epitaxy Physics Vapor phase epitaxy growth from vapor phase
Online-Zugang:	Volltext
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